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Mechanistic study of electron beam induced deposition (EBID) of metallic substrates from inorganic complexes

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CV of Prof. Fairbrother

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JHU Surface Anaylsis Lab

Electron beam induced deposition is an ultra high vacuum method of placing a metal on a substrate with extremely high precision.  A precursor inorganic complex, introduced in the gas phase in proximity to a substrate, is decomposed by a focussed electron beam resulting in deposition of the metal.  The greatest beneficiary of this technology is the electronics industry as this method allows for construction of metallic leads on the order of the width of a focussed electron beam.  However, organic contamination of the deposited material has limited this method's applicability.  Our study is currently investigating the issue of organic contamination in hopes of developing methods by which the metal can be deposited free of organic contamination without effecting the precision of deposition.

 

 

 

 

 

 

 

Students on Project

Josh Wnuk
Justin Gorham
Samantha Rosenburg

Posters

JHU Recruiting 2008

Presentations

55th AVS Meeting
47th EAS Meeting
2nd FEBIP Workshop

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Pending